The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到合二氧化硅具有纳三次结。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到合二氧化硅具有纳三次结。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
汽氧化是以蒸汽为氧化气氛,由硅片表面的硅原子和分子反应生成二氧化硅。
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